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Tescan GAIA3 SEM-FIB
TESCAN GAIA-3 GMH integrated focused ion beam-FESEM is located in room 1150 Engineering Hall (building 308 on UCI campus map)
The GAIA-3 GMH FIB-SEM is TESCAN’s newest, highest-end flagship dualbeam instrument. It has a unique three-lens electron optical design capable of dedicated modes for extreme high-resolution imaging (magnetic immersion mode, just like the FEI Magellan), enhanced depth of focus, undistorted ultra-low magnification imaging, and live 3D stereo imaging. The smart chamber design of the GAIA GMH FIB-SEM instrument allows for the simultaneous milling and collection of EBSD patterns without the need to move the sample. This flexibility is unique to TESCAN and will provide best-in-class accuracy and throughput for EBSD and EDS. The 3D-EDS and EBSD reconstructions are critical for understanding the structure and chemistry of materials. This FIB-SEM is the only such system that can be integrated with a time of flight secondary ion mass spectrometer (TOF-SIMS), which is planned for the future.
Resolution
- Electron beam resolution:
Resolution in BDM: 1.4nm @ 1kV, 2.2nm @ 200V - Focus Ion Beam resolution:
sub-2 nm images performed with gallium at 1pA, 2.5 nm resolution guaranteed
Electron optics
- High Performance Schottky Field Emission Electron Source
- TESCAN 3-lens Wide Field Optics™
COBRA-FIB Ion optics
- High-current ion column with Ga liquid-metal ion source
- Probe current: probe current 1 pA to 50 nA
Detectors and Attachments:
- Everhart-Thornley Secondary Electron Detector
- In-Beam™ SE In-lens secondary electron detector
- In-Beam™ BE In-lens On-Axis Annular BSE detector
- In-beam SE and BSE detectors
- Motorized Retractable annular backscattered scintillator-type electron detector with high sensitivity and atomic number resolution (0.1)
- Retractable STEM
- Retractable YAG BE detectors
- SITD secondary ion detector
- Oxford AZtecEnergy Advanced EDS Microanalysis System with the latest X-Max 150 mm2 silicon drift detector
- Oxford AZtec HKL NordlysMax2 integrated EBSD System
- Beam deceleration
- 5-reservoir gas injection system (W, Pt, SiOx, H2O, XeF2),
- Omniprobe 400 port-mounted piezo nanomanipulator
- In-situ plasma cleaner,
- Electron beam lithography package
- DrawBeam Basic Electron and Ion Beam Lithography Software
- Autoslicer, 3D Tomography Advanced package
- Eelectron beam induced current (EBIC) system
- Evactron Zephyr In-Situ Plasma Cleaner (decontaminator) system
- SITD Secondary Ion TESCAN Detector